Degradation of Antipyrine by UV, UV/H2O2 and UV/PS

Authors

Chaoqun Tan, Tongji UniversityFollow
Naiyun Gao, Tongji UniversityFollow
Yang Deng, Montclair State UniversityFollow
Yongji Zhang, Renmin University of China
Minghao Sui, Tongji UniversityFollow
Jing Deng, Tongji UniversityFollow
Shiqing Zhou, Tongji UniversityFollow

Document Type

Article

Publication Date

9-15-2013

Journal / Book Title

Journal of Hazardous Materials

Abstract

Degradation of antipyrine (AP) in water by three UV-based photolysis processes (i.e., direct UV, UV/H2O2, UV/persulfate (UV/PS)) was studied. For all the oxidation processes, the AP decomposition exhibited a pseudo-first-order kinetics pattern. Generally, UV/H2O2 and UV/PS significantly improved the degradation rate relevant to UV treatment alone. The pseudo-first-order degradation rate constants (kobs) were, to different degrees, affected by initial AP concentration, oxidant dose, pH, UV irradiation intensity, and co-existing chemicals such as humic acid, chloride, bicarbonate, carbonate and nitrate. The three oxidation processes followed the order in terms of treatment costs: UV/PS>UV>UV/H2O2 if the energy and chemical costs are considered. Finally, the AP degradation pathways in the UV/H2O2 and UV/PS processes are proposed. Results demonstrated that UV/H2O2 and UV/PS are potential alternatives to control water pollution caused by emerging contaminants such as AP.

DOI

10.1016/j.jhazmat.2013.06.060

MSU Digital Commons Citation

Tan, Chaoqun; Gao, Naiyun; Deng, Yang; Zhang, Yongji; Sui, Minghao; Deng, Jing; and Zhou, Shiqing, "Degradation of Antipyrine by UV, UV/H2O2 and UV/PS" (2013). Department of Earth and Environmental Studies Faculty Scholarship and Creative Works. 228.
https://digitalcommons.montclair.edu/earth-environ-studies-facpubs/228